MTI
1100C Max Vertical Vacuum Furnace with Flange (8" OD Quartz Chamber) - VBF-1200X-V9
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Vacuum Rapid Heated Pressing Furnace up to 1600C & 50 Mpa with 0.5" Graphite Die - OTF-1700X-RHP4
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Ultrafast Heating & Pressing Furnace (UHP) up to 2900°C &500 kgf with Ultra High Vacuum - RTP-MS
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High Vacuum Plasma-enhanced Chemical Vapor Deposition (CCP type) - VTC-PECVD
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Compact Atmosphere Controlled Quenching Furnace - 2" OD Tube and 1100C Max. - GSL-1100X-S-VTQ
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Compact High Pressure Gas Tube Furnace (HIP) with 12 or 20 mm ID. up to 1100C-OTF-1200X-S-HP-30A
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Atmosphere Controlled RTP Furnace for 8" Wafer up to 1000 °C - VBF-1050X-H8
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300 ml ( 35 mm ID) Super-Alloy High Pressure Reactor up to 1100C. - GSL-1100X-RC-NI300
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950°C Max CSS and RTP Furnace With Rotating Holder for 12" Wafer - OTF-1200X-RTP-II-CSS-300
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800? Rapid Melting and Quenching Furnace From Liquid Phase to Ga Melt-QF-800
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800°C Max. CSS and RTP Furnace With Rotating Holder for 5x5" Wafer- RTP-II-5-R
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2800ºC Max. Induction Heated Electrolytic Furnace with Moveable Electrodes - VEF-2800
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1700C Electrolytic Furnace with 80mm Alumina Tube & 3 Graphite Electrodes - VEF-1700
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