CVD Furnace

MTI

Tube Furnace w/ Hi-Vacuum (1E-4 torr) & 3 Channel Gas Flow Station for CVD - OTF-1200X-HVC3-series

MTI

Three Zones Tube Furnace (1200C) with High Vacuum Station (1.0E-4 torr) + 4 Channel MFC Gas Station for CVD - OTF-1200X-III-HVC-LD

MTI

Three Zones Tube Furnace (4") with Vacuum Pump (1.0E-4 torr) + 9 Channel Digital Gas Flow-meters for CVD - OTF-1200X-4-III-9HV

MTI

Three Zones CVD Tube Furnace with 8.5" Quartz Tube & Slidable Flange (1100C) - GSL-1100X-8.5-III-SR

MTI

1100°C Tube Furnace with Solid Precursor Sublimator for CVD 2D Layers of TMDs - OTF-1200X-4-NW-UL

MTI

Compact Liquid Vaporization Systems with Temperature and Pressure Control for CVD & DLCVD - LVD-F1

MTI

Dual-Tube (11"/10") CVD Furnace (1200°C Max.) for Large-Area Graphene Growth -GSL-1100X-III-D11

MTI

1200C Two Zone 4" Rotary CVD Furnace with Automatic Feeding & Receiving System - OTF1200XIIR4-AF

MTI

1600°C Max. MIST CVD Furnace for Continuous Growth of Carbon Nanotube - GSL-1600X-CFM

MTI

1200°C MIST CVD Furnace for Crystal Growth- OTF-1200X-Mist

MTI

1650 Steam Oxidation-Corrosion Furnace GSL-1700X-80CVD

MTI

Micro-CVD/PVD Furnace for in-Situ Analysis w. 2 Heating Zones, 1100°C Max. - GSL-1100-Micro

MTI

Economic MIST CVD Furnace (1200°C Max. ) for Crystal Growth- OTF-1200X-S-Mist

MTI

1200°C Microwave Plasma Assisted CVD Rotary Furnace w/ 2" Tube - GSL-1200R-MWPE

MTI

1600°C Max. MIST/LPCVD System up to 6" Wafer - MIST-1600-6

MTI

1200C Max. Ultrasonic Spray Pyrolysis 3-Zone Furnace for Nano Particles Synthesis - OTF-1200X-III-PGEP

MTI

1200C Max Dual Sliding Tube Furnace with 50 mm Tube Flanges for TCVD - OTF-1200X-S-50-DFSL

MTI

1200C Dual Zone Split Tube Furnace w/ Sample Feeding System upto 4 Crucibles For HPCVD - OTF-1200X-II-ZL

MTI

1200C PE-HPCVD Rotary Furnace with In-situ Evaporator, 4 Channel MFC and Vacuum Pump - OTF-1200X-II-PEC4

MTI

1200C Three Zone HPCVD 5"D Tube Furnace with Sequential & Co-Deposition Source Feeding System up to 3 Crucibles - OTF-1200X-III-HPCVD-S3