MTI  |  SKU: VTC6003HDLD

DC/RF 3-head High Vacuum 2” Magnetron Plasma Sputtering Coater - VTC-600-3HD-LD

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DC/RF 3-head High Vacuum 2” Magnetron Plasma Sputtering Coater - VTC-600-3HD-LD

MTI

VTC-600-3HD-LD is a combinatorial plasma sputtering system with three 2“ magnetron sputtering sources and three RF/DC power supplies. Such a sputtering system is capable of co-sputtering up to three different target materials and creates various composition profiles across the substrate (e.g. ternary materials for Li-ion rechargeable battery). This system is also suitable for sequential coating of multiple layer films such as ferroelectric, alloy, semiconductor, ceramic, dielectric, optical, oxide, hard, PTFE, etc.

SPECIFICATIONS

Power
  • 208-240 VAC, single phase, 50/60 Hz, 1500 W
Source Power
  • Three sputtering power sources
    • Two DC source: 500 W power for coating metallic materials 
    • One RF source: 300 W power, 13.56 MHz frequency for coating non-conductive materials






Magnetron Sputtering Head

 




Vacuum Chamber

  • Stainless steel vacuum chamber: Ø300 × 300 mm H
  • One 100 mm glass view port. 
  • Hinged type top flange for easy sample access
  • Here is a glance of the vacuum chamber
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Sample Stage

  • Ø140 mm rotating and heating sample stage up to 500°C 
  • Rotation speed: 1 - 20 rpm
  • Single-point programmable temperature controller

Gas Flow Control

Vacuum Pump Station

(Optional)

Water Chiller

(Optional)

  • Chilled water is required
  • One digital temperature-controlled recirculating water chiller is recommended
    • Refrigeration range: 5~35 °C
    • Flow rate: 16 L/min
    • Pump pressure: 14 psi

Film Thickness Measurement

(Optional)

Compliance

  • CE approval
  • NRTL certification is available upon request at extra cost, please contact our sales representative for the quote.

Application Note

  • This coater may be placed into a standard glovebox with modification for thin-film battery research