AlN Template on 4" Silicon (Si <111>, P type, B-doped) 4"x 500 nm - FmAlNonSiBc101D05C1FT500nmUS

AlN  Template on Silicon is made by a PVDNC method.  AlN template on Silicon is a cost effective way to replace AlN single crystal substrate.

Specifications

• Useful area: 90%
  
• Nominal AlN thickness: 500nm ±10%, one side coated, undoped AlN film
• Front Surface: as-grown
• Back surface: silicon as received
• AlN orientation: C-plane (00.1)
• Macro Defect Density: <10/cm^2
• Wafer base: Silicon [111] P type,  4" dia x0.5 mm, , one side polished,R<5 ohm.cm