Plasma Sputtering Coater in Glovebox with 3 Sputtering Heads and RF/DC Power Supplies - VTC-600-3HD-GB

Power

• 208-240VAC, single phase, 50/60 Hz, 1500 W

Glovebox VGB-6

• High-quality purification system ensures O2 and H2O below 1 PPM
• Stainless steel chamber, 1200 mm L x 740 mm W x 900 mm H
• Hinged-type front door for loading devices and samples easily
• Automatic purging to evacuate air before recirculating purification
• Automatic regeneration function
• Two Antechambers for large and small samples delivery
  

• Three sputtering power sources
  • Two DC source: 500 W power for coating metallic materials 
  • One RF source: 300 W power, 13.56 MHz frequency for coating non-conductive materials

Magnetron Sputtering Head

• Three 2" Magnetron Sputtering Heads with water cooling jackets and shutters
  • Two are connected to DC sources for metallic materials
  • One is connected to the RF source for non-conductive materials
  • Target size: 2" diameter with a thickness of 0.1 - 5 mm
    
  • Sputtering targets are optional
  • Recommended Sputtering Recipe and Useful Tips
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Vacuum Chamber

• Stainless steel vacuum chamber: Ø300 × 300 mm H
• One 100 mm glass view port. 
• Hinged type top flange for easy sample access
• Here is a glance of the vacuum chamber
  
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Sample Stage

• Ø140 mm rotating and heating sample stage up to 500°C 
• Rotation speed: 1 - 20 rpm
• Single-point programmable temperature controller
  

Gas & Flow Control

• Two mass flow controllers (MFC)
• Flow rate: 0 – 200 sccm
• nitrogen calibrated
• 1/4" vent port.

Vacuum Pumping Station

(Optional)

• For air-sensitive targets, such as Al, Ti, Cr, etc, or base pressure <1e-2 torr, a pumping station is recommended
• Turbo pump . 
  • 63 L/s turbomolecular pump, or
  • 260 L/s turbomolecular pump
• Backing pump
  • 240 L/min rotary vane pump, or
  • 200 L/min dry scroll pump
    

Water Chiller

(Optional)

• Chilled water is required
• One digital temperature-controlled recirculating water chiller is recommended
• Refrigeration range: 5~35 °C
• Flow rate: 16 L/min
• Pump pressure: 14 psi

Film Thickness Measurement

(Optional)

• Quartz crystal microbalance for in-situ film thickness measurement is optional. Accuracy up to 1Å

Compliance

• CE approval
• NRTL certification is available upon request at extra cost, please contact our sales representative for the quote.