Crystal Substrate A-Z

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TiO2 (001) 10x5x0.5mm, 1sp

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TiO2 (001) 10x10x1.0mm, 2sp - TOb101010S2

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TiO2 (001) 10x10x1.0mm, 1sp - TOb101010S1

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TiO2 (001) 10x10x0.5mm, 2sp - TOb101005S2

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TiO2 (001) 10x10x0.5mm, 1sp - TOb101005S1

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Thermal Oxide Wafer: 50 nm SiO2 Layer on Si (100), 2" dia x 0.30 mm t, N type , undoped, R>1000 ohm-cm

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Thermal Oxide Wafer: 300 nm SiO2 Layer on Si (100), 2" dia x 0.50 mm t, N type ,As-doped, 1 side polished, R:0.001-0.005 ohm.cm - Fm300SOonSIAsa50D05C

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Thermal Oxide Wafer, 30 nm SiO2 Layer on Si (100), 2" dia x 0.50 mm t, N type, As-doped, 1 side polished, R:<0.005 ohm.cm

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TGG Single Crystal Substrate: (111) 10 x 10 x. 0.5mm , 2 SP - TGGc1010S2

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TGG Single Crystal Substrate: (111) 10 x 10 x. 0.5mm , 1 SP - TGGc1010S1

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TeO2 (110) 10x10x0.5mm, 2sp - TeOe101005S2

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TeO2 (110) 10x10x0.5mm, 1sp - TeOe101005S1

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TbScO3 (110) 5x5x0.5mm 1sp

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TbScO3 (110) 10x10x0.5mm 1sp

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TbScO3 (001)10x10x0.5mm, 1sp

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Synthetic WTe2, (2) mm x (2) mm x (0.1) mm

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Synthetic WSe2, (3) mm x (2) mm x (0.1) mm

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Synthetic WS2, (3) mm x (3) mm x (0.1) mm

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Synthetic MoTe2, (3) mm x (3) mm x (0.1) mm

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Synthetic MoSe2, ( 2.5-3.0) mm x ( 2.0-2.5) mm x ( 0.1) mm