Thin Films A-Z

MTI

Silicon-on-Sapphire (11-02, R Plane ), 100mm Dia x 0.46mm,2sp, Film: 0.5 um thick,

MTI

Silicon-on-Sapphire (11-02, R Plane ), 100mm Dia x 0.46mm,1sp, Film: 1.0 um thick

MTI

Silicon-on-Sapphire (11-02, R Plane ), 100mm Dia x 0.46mm,1sp, Film: 0.6 um thick

MTI

Silicon-on-Sapphire (11-02, R Plane ), 100mm Dia x 0.46mm,1sp, Film: 0.5 um thick

MTI

Silicon Nitride Film (LPCVD) on Corning 7980, Film thickness: 1.3um ,10x5x0.5mm

MTI

Silicon Nitride Film (LPCVD) on Corning 7980, Film thickness: 1.3um ,10x10x0.5mm

MTI

Silicon Nitride Film (LPCVD) on Corning 7980, Film thickness: 1.3um

MTI

SiC-3C N-type Film on Silicon (111) Wafer, Film: 1.0um Thick substrate size: 10x10x1.0mm

MTI

SiO2+Pt thin film on Si (B-doped)substrate ,10x10x0.5mm,1sp (SiO2=500nm, Pt=60nm)

MTI

Semi-Insulating GaN Template on Sapphire (0001),3"x 0.5mm,1sp GaN Film:5um

MTI

Quartz Tube: 130 ODx120 IDx1400L mm (5"x 55") for DIY Tube Furnace - QZTube-125GE-1400

MTI

One side YIG Epi Film ( 3.08 microns) on GGG Substrate, (111), 5x5x0.5mm(2sp)

MTI

One side YIG Epi Film ( 3.08 microns) on GGG Substrate, (111), 10x10x0.5mm(2sp),

MTI

One Side 100nm YBCO Film on SrTiO3(100) 10x10x0.5 mm substrate - FmYBCOonSTOa101005S1FT100nm

MTI

One Side (300-400) nm YBCO Film on SrTiO3 (100) 10x10x0.5 mm substrate

MTI

Nickel<111> Film (100nm) Coated SiO2/Si Wafer -(100) P/Boron ,10x10x0.5mmSSP, R:1-20 ohm.cm - Ni-SO/Si-101005S1

MTI

Nickel <111> Film( 100nm) Coated Si Wafer (100) P/Boron ,10x10x0.5mmSSP, R:1-20 ohm.cm

MTI

Nickel <111> Film (100nm) + 300 nm SiO2 coated Silicon Wafer -4" dia .(100) P/Boron ,SSP, R:1-20 ohm.cm

MTI

Molybdenum Wire for MTI Vertical Furnace as pulling wire

MTI

MgO (100) Substrate 10x10 x1.0 mm , 2SP, Qty Discounted! - MGa101010S2