Thin Films A-Z

MTI

FTO Glass Substrate (TEC 7) with Pattern 1" x 1" x 1.1 mm, R: 7-10 ohm/sq 25pcs /pack

MTI

FTO Glass Substrate (TEC 7) 20mm x 20mm x 3.0 mm, R: 6-8 ohm/sq 25pcs /pack

MTI

FTO Glass Substrate (TEC 7) 100 x 100 x 1.1 mm, R: 7-10 ohm/sq 5 pcs /pack

MTI

FTO Glass Substrate (TEC 7) 1.0" x 3" x 3.0 mm, 6-8 ohm/sq, 25pcs /pack - FTO257630TEC7gp25

MTI

FTO Glass Substrate (TEC 7) 1" x 1" x 3.0 mm, R: 6-8 ohm/sq 25pcs /pack

MTI

FTO Glass Substrate (TEC 7) 1" x 1" x 1.1 mm, R: 7-10 ohm/sq 25pcs /pack

MTI

FTO Glass Substrate (TEC 15) 100 x 100 x 3.0 mm, R: 12-14 ohm/sq 25 pcs /pack

MTI

FTO Glass Substrate (TEC 15) 1" x 1" x 2.2 mm, R:12-14 ohm/sq 25pcs /pack

MTI

Diamond on Silicon Wafer(DOS), 5x5mm , 2 um Thick, 10 nm Ra

MTI

Diamond on Oxide Wafer(DOI), 5 mm x 5 mm, 2um Thick, 10nm Ra

MTI

Electric Conductive Diamond Film on Insulator(DCI), 5x5 mm , 2 um Thick,

MTI

Cu Film on Ta/SiO2/Silicon Wafer, Cu=400 nm Ta=50nm SiO2=300nm, Si(100) P-type B-doped 10x10x0.525mm, 1sp

MTI

Cu Film on Ta/SiO2/ Silicon Wafer, Cu=400 nm Ta=50nm SiO2=300nm, Si(100) P-type B-doped5x5x0.525mm, 1sp

MTI

Cu Film on Ta/SiO2/ Silicon Wafer, Cu=100 nm Ta=50nm SiO2=300nm, Si(100) P-type B-doped 10x10x0.525mm, 1sp

MTI

Cu Film on Ta/SiO2/ 4"Silicon Wafer, Cu=400 nm Ta=50nm SiO2=300nm, Si(100) P-type B-doped 4"x0.525mm, 1sp

MTI

Cu Film on Ta/SiO2/ 4"Silicon Wafer, Cu=100 nm Ta=50nm SiO2=300nm, Si(100) P-type B-doped 4"x0.525mm, 1sp

MTI

Cu Film on Ta/Silicon Wafer, Cu=100 nm Ta=20nm,,Si(100) B-doped ,10x10x0.525mm,R:1-20 ohm.cm, 1sp

MTI

Cu Film on Ta/Silicon Wafer , Cu=100 nm Ta=20nm,,Si(100) B-doped ,10x5x0.525mm,R:1-20 ohm.cm, 1sp

MTI

CeO2 Film (40 nm one side) on YSZ, <111>10x10x0.5 mm, 1sp - FmCeO2onYSZc101005S1FT40nm

MTI

CeO2 Film (40 nm one side) on YSZ <110> 10x10x0.5 mm - FmCeO2onYSZe101005S1FT40nm