Crystal Substrate A-Z

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GaN (0001) 10x10.5x0.35mm,2sp ,Semi-insulating

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GaN (0001) 10x10.5x0.35mm,1sp, Semi-insulating

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GaAs, VGF Grown (110) orientation, SI, undoped, 2" dia x 0.5mm, 2sp - GAUe50D05C2-US

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GaAs, VGF Grown (110) orientation, SI, undoped, 2" dia x 0.5mm, 1sp,

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GaAs, VGF Grown (110) ori. un-doped, Semi-Insulating, 20x20x0.5mm, 1sp

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GaAs, VGF Grown (110) ori. un-doped, 10x10x0.5mm, 1sp

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GaAs, VGF Grown (110) ori. N type, Si-doped, 5 x 5 x 0.3 mm, 2sp

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GaAs, VGF Grown (110) ori. N type, Si-doped, 2" dia x 0.35mm, 1sp

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GaAs, VGF Grown (110) ori. N type, Si-doped, 10x10x0.3mm, 2sp

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GaAs, VGF Grown (110) ori. N type, Si-doped, 10 x 5 x 0.3 mm, 2sp

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GaAs, Growing Method: VGF(100) Si doped, N-type, 4" dia x 0.625mm, 2sp, Carrier Concentration: (1.47-3.78) x 10^18 /cm^3 - GASia100D06C2US5

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GaAs, Growing Method: VGF(100) Si doped, N-type, 3" dia x 0.625mm, 2sp, Carrier Concentration: (1.4-3.96) x 10^18 /cm^3 - GASia76D0625C2US5

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GaAs, Growing Method: VGF ,(111)B , Zn-doped, P-type, 2" dia x 0.4 mm, 2sp

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GaAs, Growing Method: VGF ,(111)A, Zn-doped, P-type, 2" dia x 0.5mm, 2sp - GAZncA50D05C2US5

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GaAs Wafer - Growing Method: VGF (100), Zn doped, P-Type, 3"x0.5 mm, 1sp

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GaAs Wafer - Growing Method: VGF (100) Zn doped Ptype, , 2"x0.35 mm, 1sp, CC: (2.67-3.27) x 10^18 /cm^3

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GaAs, Growing Method: VGF (111)B, Si-doped, 2" dia x 0.35mm, 2sp - GASicB50D035C2US

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GaAs Wafer - Growing Method: VGF (100) Zn doped P-type, , 2"x0.5 mm, 2sp, (8.62-9.38) x 10^17 /cm^3

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GaAs Wafer - Growing Method: VGF (100) Zn doped P-type, , 2"x0.5 mm, 1sp, (5.17-9.38) x 10^17 /cm^3

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GaAs Wafer - Growing Method: VGF (100) P type Zn doped , 3"x0.625 mm, 1sp